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Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62
Figure 1: SEM images of NWs grown on gold-sputtered Si[111] exposed to NPS vapor at 375 °C for 1 h (left: sid...
Figure 2: Analysis of NWs grown on gold-sputtered Si[111] for 1 h at 375 °C. Top left: Backscattered-electron...
Figure 3: TEM images of NWs grown on gold-sputtered Si[111] for 1 h at 375 °C. The FFT of the HRTEM image and...
Figure 4: SEM images of NWs grown on gold-sputtered Si[111] by exposure to NPS vapor for 1 h at 650 °C.
Figure 5: SEM image of gold nanoparticles formed on the native oxide surface of Si[111] after annealing of Au...
Figure 6: SEM image of NWs grown at 650 °C for 1 h on Si[111] surfaces with annealed gold films (left: sample...
Figure 7: SEM image of NWs grown at 375 °C for 1 h, on annealed gold films of different sputtering times (lef...
Figure 8: SEM image of the chemisorbed gold nanoparticles on the aminopropylated Si[111] surface.
Figure 9: SEM image of NWs grown from nanoparticles at 650 °C without prior treatment (left) and at 375 °C af...
Figure 10: SEM images with different magnifications of a spin coated film of “liquid bright gold” on Si[111] a...
Figure 11: SEM image of Si NWs obtained from spin-coated “liquid bright gold” films after annealing at 650 °C,...
Figure 12: Optical microscopy images of the different steps of the irradiation-induced pattern formation. Left...
Figure 13: SEM images (different magnifications) of Si NWs obtained from UV-patterned spin-coated “liquid brig...
Figure 14: SEM image of the border region of a Si NW pattern obtained from UV-patterned “liquid bright gold” f...